New Route to Fabricating PDMS-Based Microfluidic Components

Example of a test pattern of 20 μm squares in spun-coated PDMS produced using the new PMGI-based lithography method.

The use of PMGI photo-resist enables high spatial resolution lithography to be performed on PDMS without any surface modification extending the range of PDMS processing for MEMS and micro-fluidic structures. The adhesion between the PGMI and PDMS also facilitates multilayer structures to be fabricated and enables the use of traditional semiconductor processing cleanroom equipment as an alternative to soft lithography. These devices are being designed for energy applications, to convert mechanical into electrical energy, and electrical into mechanical energy.

David A. Weitz (Physics & Applied Physics)
Cynthia M. Friend (SEAS)
David R. Clarke (Material Science & Mechanical Engineering)
Zhigang Suo (Mechanical Engineering)
Harvard MRSEC (DMR-1420570)